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Proceedings Paper

Optomechanical design of the cosmic hot interstellar plasma spectrometer (CHIPS)
Author(s): Michael Sholl; William Donakowski; Martin M. Sirk; Tobias Clauss; Michael L. Lampton; Jerry Edelstein; Mark Hurwitz
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Paper Abstract

CHIPS is a NASA UNEX mission designed for diffuse background spectroscopy in the EUV bandpass from 90-260Å. The spectrometer is optimized for peak resolution near 170 Å, in order to study diffuse emissions from cooling million degree plasma. Details of local bubble thermal pressure, spatial distribution, and ionization history are the goals of CHIPS observations. We discuss the opto-mechanical design adopted to meet the throughput, signal to noise, and spectral resolution requirements within the mass, volume, and budgetary constraints of a UNEX Delta-II secondary payload. Mechanical tolerance requirements for the six spectrometer channels are discussed, along with details of the lightweight mounting scheme for CHIPS diffraction gratings, front cover slit mechanisms and thermal design. Finally, visible light and vacuum alignment techniques are discussed, as well as with methods employed to minimize stray light.

Paper Details

Date Published: 24 February 2003
PDF: 12 pages
Proc. SPIE 4854, Future EUV/UV and Visible Space Astrophysics Missions and Instrumentation, (24 February 2003); doi: 10.1117/12.460031
Show Author Affiliations
Michael Sholl, Space Sciences Lab., Univ. of California/Berkeley (United States)
William Donakowski, Space Sciences Lab., Univ. of California/Berkeley (United States)
Martin M. Sirk, Space Sciences Lab., Univ. of California/Berkeley (United States)
Tobias Clauss, Univ. Tübingen (Germany)
Michael L. Lampton, Space Sciences Lab., Univ. of California/Berkeley (United States)
Jerry Edelstein, Space Sciences Lab., Univ. of California/Berkeley (United States)
Mark Hurwitz, Space Sciences Lab., Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 4854:
Future EUV/UV and Visible Space Astrophysics Missions and Instrumentation
J. Chris Blades; Oswald H. W. Siegmund, Editor(s)

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