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Proceedings Paper

Characterization of micro-optical components fabricated by deep-etch x-ray lithography
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Paper Abstract

Deep-etch x-ray lithography allows the fabrication of micro-optical components with critical lateral dimensions of a few micrometers and structural heights up to several hundred micrometers. Using interferometric methods, the structural tolerances of the side walls of fabricated microstructures are shown to be about 0.3 micrometers per 300 micrometers of structural height. A parallel HeNe laser beam is easily passed through several microprisms, which is evidence for the high precision achievable in positioning micro-optical components on a baseplate. Focussing a light beam by cylinder lenses is also possible. The free two- dimensional shape and the high precision achievable in positioning allow fabrication of micro- optical components with integrated fiber fixing grooves in which multi-mode fibers are precisely positioned. Simple fiber connectors, e.g., fiber forks or Y-couplers, can be achieved. By using a light-guiding resist system, divergence losses can be diminished.

Paper Details

Date Published: 1 August 1991
PDF: 9 pages
Proc. SPIE 1506, Micro-Optics II, (1 August 1991); doi: 10.1117/12.45972
Show Author Affiliations
Jost Goettert, Kernforschungszentrum Karlsruhe (Germany)
Juergen Mohr, Kernforschungszentrum Karlsruhe (Germany)


Published in SPIE Proceedings Vol. 1506:
Micro-Optics II
Anna Maria Verga Scheggi, Editor(s)

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