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Proceedings Paper

Fabrication of micro-optical components by laser beam writing in photoresist
Author(s): Michael T. Gale; Graham K. Lang; Jeffrey M. Raynor; Helmut Schuetz
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Paper Abstract

A laser beam writing system for the fabrication of micro-optical elements as relief structures in photoresist is described. Using a computer controlled precision xy stage and a modulated, focused laser beam, a wide range of surface relief microstructures has been produced, with typical periods of 10 - 100 micrometers and a maximum relief amplitude of about 5 micrometers . Examples include microlens arrays, kinoforms and other phase structures for applications in optical computing, optical interconnects and micro-optical systems in general.

Paper Details

Date Published: 1 August 1991
PDF: 6 pages
Proc. SPIE 1506, Micro-Optics II, (1 August 1991); doi: 10.1117/12.45959
Show Author Affiliations
Michael T. Gale, Paul Scherrer Institute (Switzerland)
Graham K. Lang, Paul Scherrer Institute (Switzerland)
Jeffrey M. Raynor, Paul Scherrer Institute (Switzerland)
Helmut Schuetz, Paul Scherrer Institute (Switzerland)


Published in SPIE Proceedings Vol. 1506:
Micro-Optics II
Anna Maria Verga Scheggi, Editor(s)

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