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Proceedings Paper

Electron-beam lithography for the microfabrication of OEICs
Author(s): Herbert Engel; Walter Doeldissen
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Paper Abstract

The use of e-beam direct write lithography for the microfabrication of OEICs is demonstrated. Special design tools were developed for waveguide structures to enhance CAD and lithographic performance. Besides high resolution applications (e.g., gratings), e-beam lithography was used for three-dimensional resist shaping in order to develop waveguide tapers.

Paper Details

Date Published: 1 August 1991
PDF: 5 pages
Proc. SPIE 1506, Micro-Optics II, (1 August 1991); doi: 10.1117/12.45958
Show Author Affiliations
Herbert Engel, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)
Walter Doeldissen, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)


Published in SPIE Proceedings Vol. 1506:
Micro-Optics II
Anna Maria Verga Scheggi, Editor(s)

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