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Proceedings Paper

Fabrication of silicon grisms
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Paper Abstract

Silicon grisms are suitable optical devices that allow for a spectroscopic mode able to effectively complement the natural imaging mode of IR cameras, providing high spectral resolution (R>5000) in the near infrared. We present a review of the fabrication process aimed to produce IR grisms with high refractive index. Such devices are intended to implement a high resolution mode in the Near IR Camera-Spectrograph, NICS, the user instrument at the focal plane of the Italian national telescope Galileo. Litho masking and anisotropic etching techniques have been employed to get, firstly, silicon gratings of suitable size for astronomical use, then warm bonding techniques have been used to obtain the final grisms in echelle configuration. The results and the problems encountered in the bonding procedure are presented along with a future implementation of silicon grisms in space instrumentation.

Paper Details

Date Published: 30 January 2003
PDF: 8 pages
Proc. SPIE 4842, Specialized Optical Developments in Astronomy, (30 January 2003); doi: 10.1117/12.459460
Show Author Affiliations
Fabrizio Vitali, Osservatorio Astronomico di Roma (Italy)
Elena Cianci, Istituto di Elettronica dello Stato Solido (Italy)
Vittorio Foglietti, Istituto di Elettronica dello Stato Solido (Italy)
Dario Lorenzetti, Osservatorio Astronomico di Roma (Italy)

Published in SPIE Proceedings Vol. 4842:
Specialized Optical Developments in Astronomy
Eli Atad-Ettedgui; Sandro D'Odorico, Editor(s)

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