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Proceedings Paper

Noncontact electrical critical dimensions metrology sensor for chrome photomasks
Author(s): Nadine Guillaume; Markku Lahti; Michael W. Cresswell; Richard A. Allen; Loren W. Linholm; Mona E. Zaghloul
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Paper Abstract

This paper describes a novel non-contact capacitive-sensor metrology tool developed for chrome photomasks. This work further describes suitable types of test structures printed on photomasks appropriate for linewidth metrology. The Critical Dimension (CD) metrology sensor is developed using a Low Temperature Co-Fired Ceramic (LTCC) technology to reduce the effects of parasitic capacitances. The sensor is based on non-contact micro-capacitance measurements of features on chrome-on-glass reticles. The CD-extraction algorithms based on the capacitance measurements are formulated from extensive evaluation with a Maxwell simulator. The purpose of the non-contact micro-capacitance sensor is to measure chrome-feature linewidths in the range of 0.4 (mu) M - 0.5 micrometers . These dimensions correspond to a 0.18 micrometers process on a 4X mask.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458365
Show Author Affiliations
Nadine Guillaume, The George Washington Univ. (United States)
Markku Lahti, VTT Electronics (Finland)
Michael W. Cresswell, National Institute of Standards and Technology (United States)
Richard A. Allen, National Institute of Standards and Technology (United States)
Loren W. Linholm, National Institute of Standards and Technology (United States)
Mona E. Zaghloul, The George Washington Univ. (United States)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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