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Proceedings Paper

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node
Author(s): Jerry Xiaoming Chen; John Riddick; Matt J. Lamantia; Azeddine Zerrade; Robert K. Henderson; Greg P. Hughes; Cyrus Emil Tabery; Khoi A. Phan; Chris A. Spence; Amy A. Winder; William A. Stanton; Eugene A. Delarosa; John G. Maltabes; Cecilia E. Philbin; Lloyd C. Litt; Anthony Vacca; Scott Pomeroy
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Paper Abstract

Repair and printability of 193nm alternating aperture phase shift masks have been studied in detail in an effort to understand the overall production capability of these masks for wafer production at the 100nm node and below.

Paper Details

Date Published: 11 March 2002
PDF: 12 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458362
Show Author Affiliations
Jerry Xiaoming Chen, DuPont Photomasks, Inc. (United States)
John Riddick, DuPont Photomasks, Inc. (United States)
Matt J. Lamantia, DuPont Photomasks, Inc. (United States)
Azeddine Zerrade, DuPont Photomasks, Inc. (United States)
Robert K. Henderson, DuPont Photomasks, Inc. (United States)
Greg P. Hughes, DuPont Photomasks, Inc. (United States)
Cyrus Emil Tabery, Advanced Micro Devices, Inc. (United States)
Khoi A. Phan, Advanced Micro Devices, Inc. (United States)
Chris A. Spence, Advanced Micro Devices, Inc. (United States)
Amy A. Winder, Micron Technology, Inc. (United States)
William A. Stanton, Micron Technology, Inc. (United States)
Eugene A. Delarosa, Micron Technology, Inc. (United States)
John G. Maltabes, Motorola (United States)
Cecilia E. Philbin, Motorola (United States)
Lloyd C. Litt, Motorola (United States)
Anthony Vacca, KLA-Tencor Corp. (United States)
Scott Pomeroy, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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