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Proceedings Paper

Optical performances under the conditions of various geometrical structures and phase defects in phase edge PSM
Author(s): Tae Moon Jeong; In-Gyun Shin; Dong-Hoon Chung; Sung-Hyuck Kim; Hyoungdo Kim; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn
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Paper Abstract

As high-speed non-memory devices require narrow gate widths of less than 100 nm, the technology for this requirement shou7ld be guaranteed. In view of microlithography, one candidate to support such a narrow gate width is a phase edge (PE) PSM technique. However, because this PEPSM technique has not yet been thoroughly developed in the viewpoint of mask making, an activity to find optimal mask parameters for best optical performances should be made. In this paper, optical performances of PEPSM have been described under various geometrical structures and phase defects as mask parameters. Optical performances of PEPSM were strongly dependent on the pattern pitch, the optimal phase, and the mask structure. From our studies, the optimal phase of shifter was considered to be 179 degrees and the optimal mask structure expressed in dry/wet etch ratio was 50/130 degrees when considering the overall pitch. The phase defect having its phase of less than 50 percent did not seriously affect the lithography patterning. We could easily make PEPSMs having maximum phase defects of 50 degrees with our hybrid etch process. Finally, we could build the manufacturing process of PEPSM for sub-100 nm resist CD patterning.

Paper Details

Date Published: 11 March 2002
PDF: 10 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458361
Show Author Affiliations
Tae Moon Jeong, Samsung Electronics Co., Ltd. (South Korea)
In-Gyun Shin, Samsung Electronics Co., Ltd. (South Korea)
Dong-Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)
Sung-Hyuck Kim, Samsung Electronics Co., Ltd. (South Korea)
Hyoungdo Kim, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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