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Proceedings Paper

Half-tone PSM inspection sensitivity of 257-nm light source MC-3000
Author(s): Hideo Tsuchiya; Kyoji Yamashita; Shinji Sugihara; Takeshi Fujiwara; Ryoji Yoshikawa
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Paper Abstract

Binary (Chromium) and, KrF/ArF phase shift masks (PSM) were inspected by MC-3000, which uses DUV (257nm) light source, and an evaluated results of these sensitivities are shown. In the case of the chromium mask, sufficient detection sensitivity for 130nm-device inspection was obtained. For KrF and ArF phase shift masks, the detection sensitivities of the edge and the corner areas are practically equivalent to that of chromium. Though the detection sensitivity of a minute pinhole is slightly lower under the influence of the diffracted light. With an ArF phase shift mask, the contrast of absorber and a glass portion is low, and so improvement of the signal noise ratio of a sensor becomes essential for false-defect control. Additionally, the minute pinhole detection sensitivity will be higher, if a reflective inspection etc. is carried out.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458360
Show Author Affiliations
Hideo Tsuchiya, Toshiba Corp. (Japan)
Kyoji Yamashita, Toshiba Corp. (Japan)
Shinji Sugihara, Toshiba Corp. (Japan)
Takeshi Fujiwara, Toshiba Corp. (Japan)
Ryoji Yoshikawa, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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