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Proceedings Paper

Zep process optimization for sub-micron reticle fabrication in high-acceleration voltage writing tool
Author(s): Junsik S. Cho; Lee-Ju Kim; Cheol Shin
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Paper Abstract

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Paper Details

Date Published: 11 March 2002
PDF: 9 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458349
Show Author Affiliations
Junsik S. Cho, DuPont Photomasks Inc. (South Korea)
Lee-Ju Kim, DuPont Photomasks Inc. (South Korea)
Cheol Shin, DuPont Photomasks Inc. (South Korea)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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