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Proceedings Paper

Photomask blank shelf-life study on e-beam chemically amplified resists
Author(s): Feng Qian; David Y. Chan; Masahiko Ishizuka; Akira Kurabayashi; Takumi Ogawa; Ryoichi Kobayashi; Takaei Sasaki
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Paper Abstract

Fabrication of 130nm and below technology node photomasks favors EBeam chemically amplified resist (CAR) due to its higher sensitivity, contrast and resolution. However, chemically amplified resist is in general much more sensitive to the environment compared to conventional resists such as PBS and ZEP7000. Coated CAR blank shelf life will have a major impact on CD control of high-end photomask manufacturing especially for extended delay situations. This paper presents blank supplier packaging methods and rawstock storage conditions and their impact on CAR blank shelf life in the photomask fabrication facility. We selected one of the top chemically amplified e-beam resists for this study.

Paper Details

Date Published: 11 March 2002
PDF: 11 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458337
Show Author Affiliations
Feng Qian, Photronics, Inc. (United States)
David Y. Chan, Photronics, Inc. (United States)
Masahiko Ishizuka, Ulvac Coating Corp. (Japan)
Akira Kurabayashi, Ulvac Coating Corp. (Japan)
Takumi Ogawa, Ulvac Coating Corp. (Japan)
Ryoichi Kobayashi, Ulvac Coating Corp. (United States)
Takaei Sasaki, Ulvac Coating Corp. (Japan)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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