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Proceedings Paper

Defects analysis of mask blanks
Author(s): Dong-Heok Lee; Dae-Woo Kim; Jung-Kwan Lee; Woo-Gun Jeong; Sang-Soo Choi; Sung-Mo Jung; Soo-Hong Jeong
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Paper Abstract

As photomask making procedures extend to more and more complex and difficult, the detected numbers of the quartz defects are increasing trend. These kinds of defects have been less detected frequently or not detected before. But, it can be found enough now because inspection machines are developed high resolution, short wavelength light source and low pixel size to find small size defects. Defect shapes and sizes detected by inspection machine are evaluated and classified to several types with SEM and then analyzed the wafer printing result with transmission data of the inspection and AIMS simulation result. By this analyzed result, the judge reference of the quartz defect was provided when the defect was detected by inspection machine during producing photomask. This will improve mask yield by reducing mask reject ratio classified blank mask defect problems.

Paper Details

Date Published: 11 March 2002
PDF: 6 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458336
Show Author Affiliations
Dong-Heok Lee, PKL, Inc. (South Korea)
Dae-Woo Kim, PKL, Inc. (South Korea)
Jung-Kwan Lee, PKL, Inc. (South Korea)
Woo-Gun Jeong, PKL, Inc. (South Korea)
Sang-Soo Choi, PKL, Inc. (South Korea)
Sung-Mo Jung, PKL, Inc. (South Korea)
Soo-Hong Jeong, PKL, Inc. (South Korea)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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