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Proceedings Paper

Dry etching characteristics of attenuated phase-shifting masks using Cl2/CF4/O2/He plasmas
Author(s): Se-Jong Choi; Han-Sun Cha; Si-Yeul Yoon; Sung-Mo Jung; Sang-Soo Choi; Soo-Hong Jeong
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Paper Abstract

The attenuated phase-shifting mask (Att. PSM) is one of the most useful technologies for sub-micron lithography.1) However, it is difficult to control the parameters such as phase or transmittance when a phase-shifting mask is applied to practical use. Also, to apply phase shift layer (MoSiON), it remains that affects several critical mask parameters including critical dimension (CD), sidewall slope and surface damage. So, in this paper, the effects of added Cl2 gas, DC bias voltage on the etch characteristics were studied using an inductively coupled CF4-based plasma. The plasma characteristics and etch properties of inductively coupled CF4O2He and Cl2CF4O2He Plasmas were investigated on the etch properties of MoSiON. Each added gas had a unique property on the etch rate, anisotropy, surface roughness and sidewall morphology. As the results of experiment, the most vertical profile and smooth surface were obtained using the 10 sccm Cl2, -200V dc bias. By increasing the dc bias voltage, the undercut on MoSiON layer is not occurred. When plentiful Cl2 gas was added to the CF4O2He plasma, surface roughness was decreased but the edge of Cr slope was damaged at 15 sccm Cl2. It is suggested from the results of this experiment that the pattern profile and surface roughness on MoSiON layer can be controlled by both quantity of Cl2 gas and dc self-bias voltage.

Paper Details

Date Published: 11 March 2002
PDF: 10 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458335
Show Author Affiliations
Se-Jong Choi, PKL Corp. (South Korea)
Han-Sun Cha, PKL Corp. (South Korea)
Si-Yeul Yoon, PKL Corp. (South Korea)
Sung-Mo Jung, PKL Corp. (South Korea)
Sang-Soo Choi, PKL Corp. (South Korea)
Soo-Hong Jeong, PKL Corp. (South Korea)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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