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Proceedings Paper

Development of refined cleaning technique focusing on ecological viewpoint
Author(s): Koji Tange; Yoshikazu Nagamura; Kunihiro Hosono; Yuki Oomasa; Koichi Kido; Atsushi Hayashi; Yasutaka Kikuchi; Ichiro Imagawa; Yuichi Matsuzawa; Hozumi Usui
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Paper Abstract

We are focusing on a high-performance cleaning process with minimum use of chemicals. For the substitution of chemicals, the refined cleaning tools and process have been developed, which use the high-concentration ozonic together with hydrogen water. To optimize a cleaning process, we have evaluated the removal and decomposition efficiency of organic compounds on the mask surface, the optical degradation of Cr and Suicide materials and so on. In conclusion, the substitution of sulfuric acid, ammonia and other chemicals is available for practical cleaning process by combining their functional cleaning steps. Especially in the ArF generation, this cleaning technique was found to be promising for the reduction of optical-damage and chemical residues for mask patterns and as well as high-efficiency particle removal.

Paper Details

Date Published: 11 March 2002
PDF: 12 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458332
Show Author Affiliations
Koji Tange, Mitsubishi Electric Corp. (Japan)
Yoshikazu Nagamura, Mitsubishi Electric Corp. (Japan)
Kunihiro Hosono, Mitsubishi Electric Corp. (Japan)
Yuki Oomasa, Toppan Printing Co., Ltd. (Japan)
Koichi Kido, Toppan Printing Co., Ltd. (Japan)
Atsushi Hayashi, Toppan Printing Co., Ltd. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Ltd. (Japan)
Ichiro Imagawa, Toppan Printing Co., Ltd. (Japan)
Yuichi Matsuzawa, Toppan Printing Co., Ltd. (Japan)
Hozumi Usui, WACOM Electric Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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