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Proceedings Paper

Partitioning of photomask processes for defects
Author(s): Charles H. Howard; Russell Shoemake; Phillip Lim; Curt J. Linder
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Paper Abstract

Elimination of photomask defects requires identifying the sources of contaminants at each process step. Current industry practice is to perform defect inspection at the end of processing. This makes determining the source of defect generators extremely difficult. This paper presents data taken from inspections performed immediately following the principal processing steps done in photomask manufacture. The KLA-Tencor SLF27 TeraStar™ inspection tool was used to inspect a generic test pattern after developing, etching and stripping of the resist.

Paper Details

Date Published: 11 March 2002
PDF: 12 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458318
Show Author Affiliations
Charles H. Howard, DuPont Photomasks, Inc. (United States)
Russell Shoemake, DuPont Photomasks, Inc. (United States)
Phillip Lim, KLA-Tencor Corp. (United States)
Curt J. Linder, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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