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Proceedings Paper

New generation photomasks: 193-nm defect printability study
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Paper Abstract

Today some IC manufacturers obtain finer circuit geometries by adding scatter bars (SB) to conventional binary masks as an efficient resolution enhancement technique (RET).1 These SB perform best when they are wide. However, to achieve better resolution and wider process windows modern stepper equipments feature lower wavelengths and higher numerical aperture lenses. These new steppers require narrower scatter bars to prevent them from printing on the wafer, and their effectiveness as a RET is diminishing as we follow the stepper technology 'roadmap'.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458315
Show Author Affiliations
Linard Karklin, Numerical Technologies, Inc. (United States)
Paul van Adrichem, Numerical Technologies, Inc. (United States)
Frank A.J.M. Driessen, Numerical Technologies, Inc. (Germany)
Stan Mazor, Numerical Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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