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Proceedings Paper

Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs
Author(s): Gerhard W.B. Schlueter; Walter Steinberg; John M. Whittey
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Paper Abstract

A new CD metrology system with 248 nanometer illumination is the subject of this paper. The system configuration and major component improvements is described. Test measurements on chrome-on-glass and attenuated phase shift masks were performed demonstrating improved CD linearity down to approximately 300 nm and long term repeatability performance in the 2 nm realm.

Paper Details

Date Published: 11 March 2002
PDF: 7 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458314
Show Author Affiliations
Gerhard W.B. Schlueter, Leica Microsystems GmbH (Germany)
Walter Steinberg, Leica Microsystems GmbH (Germany)
John M. Whittey, Leica Microsystems, Inc. (United States)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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