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Proceedings Paper

Pattern generation with SLM imaging
Author(s): Torbjoern Sandstrom; Per Askebjer; Jesper Sallander; Raoul Zerne; Andrzej Karawajczyk
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Paper Abstract

Pattern generation founded on micro-mirror spatial light modulator (SLM) imaging presents a way to manage the decreasing feature sizes and increasing pattern complexities dictated by Moore's law. This paper identifies the critical elements of the imaging in the implementation of such a pattern generator. We show how the laser illumination, SLM chip, and optics collectively generate the image, and in particular, that these elements can be manufactured and integrated to specification. Expected deficiencies and variations in image quality are then effectively countered with calibration routines that bring final performance to within lithographic requirements, while also being manageable in design and turn-around-times.

Paper Details

Date Published: 11 March 2002
PDF: 7 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458312
Show Author Affiliations
Torbjoern Sandstrom, Micronic Laser Systems AB (Sweden)
Per Askebjer, Micronic Laser Systems AB (Sweden)
Jesper Sallander, Micronic Laser Systems AB (Sweden)
Raoul Zerne, Micronic Laser Systems AB (Sweden)
Andrzej Karawajczyk, Micronic Laser Systems AB (Sweden)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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