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Proceedings Paper

Implementation and characterization of a DUV raster-scanned mask pattern generation system
Author(s): Michael J. Bohan; Henry Chris Hamaker; Warren Montgomery
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Paper Abstract

Etec Systems, Inc., an Applied Materials company, has completed the implementation and characterization of a deep ultraviolet (DUV), multibeam, raster-scanned mask patterning and integrated process solution. The ALTA® 4000 mask pattern generation system integrates a new data path, environmental control system, DUV optics, a 257nm DUV continuous-wave laser source, and an environmentally stable chemically amplified resist (CAR) process to deliver superior productivity, improved resolution, and critical dimension (CD) control required for volume 130nm mask production. Additionally, to obtain the maximum benefit of this mask pattern generation system, Etec has completed development of an environmentally stable CAR process, which has been tailored to allow the maskmaking industry to continue to receive pre-coated mask blanks from commercial suppliers. This paper details the system architecture and presents system performance and characterization data. The characterization results of the integrated system and process solution are also presented. This integrated pattern generation and process solution continues the tradition of the production workhorse ALTA product line with the introduction of the ALTA 4000 scanned-laser mask pattern generation system.

Paper Details

Date Published: 11 March 2002
PDF: 22 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458301
Show Author Affiliations
Michael J. Bohan, Etec Systems, Inc. (United States)
Henry Chris Hamaker, Etec Systems, Inc. (United States)
Warren Montgomery, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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