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Proceedings Paper

CD metrology on OPC features using light optical and electron optical tools
Author(s): Thomas Schaetz; Stefan Doebereiner; Gerd Scheuring; Hans-Juergen Brueck
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Paper Abstract

TO enable lithography at low k1 factors, OPC on photo masks is a method of strong and growing importance. But CD metrology of OPC features is suffering form several drawbacks: (1) OPC structures often do not have two parallel edges, which are required for usual CD metrology methods; (2) There are no commonly agreed standard definitions how and where to measure some types of OPC structures; (3) The CDs are very small; (4) There is no automated software for the measurement of OPC structures on operator level. A metrology method and a fully automated software for metrology of OPC structures based on LWM optical CD metrology tools is shown in this paper. It automatically distinguishes between hammerheads and serifs in various orientations. The method works analog to pitch measurements and requires only pitch calibration and no additional CD calibration. The results of light optical metrology tools with i-line and DUV wavelength is compared to CD SEM results.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458298
Show Author Affiliations
Thomas Schaetz, Infineon Technologies AG (Germany)
Stefan Doebereiner, MueTec GmbH (Germany)
Gerd Scheuring, MueTec GmbH (Germany)
Hans-Juergen Brueck, MueTec GmbH (Germany)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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