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Proceedings Paper

First performance data obtained on next-generation mask metrology tool
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Paper Abstract

Continually shrinking features sizes coupled with tighter tolerances for critical dimensions and feature placement necessitate development of new metrology tools that can meet the demand for more precision and accuracy during the measurement process. With this in mind Leica Microsystems has developed a next general metrology system that is capable of fulfilling both the feature placement and critical dimension metrology requirements. This paper contains a brief description of the new system hardware and design changes incorporated into the Leica LMS IPRO2 as well as recent measurement data indicative of initial tool performance.

Paper Details

Date Published: 11 March 2002
PDF: 10 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458296
Show Author Affiliations
Gerhard W.B. Schlueter, Leica Microsystems GmbH (Germany)
Klaus-Dieter Roeth, Leica Microsystems GmbH (Germany)
John M. Whittey, Leica Microsystems, Inc. (United States)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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