Share Email Print

Proceedings Paper

Slashing turnaround-time by introducing distributed computing
Author(s): Gerd Ballhorn
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Mask data preparation has become a major concern in the supply chain from design to the fab. The mask industry is facing a number of problems induced by a massive introduction of OPC. Affecting the design flow the exponentially escalating data volume came into focus because the data-prep infrastructure fails to keep up with this development. As a consequence the turn around time from tape out to 'ready to write' data is permanently rising from a couple of hours 2 years ago to many days/weeks nowadays. Computation times of many days on modern workstations is no exception anymore. Especially when mask data have to be converted to another writing tools data format or just a mask manufacturing process has to be adapted by modifying the data bias, we encountered computing times of more than hundred hours for a single layer. We found a way to reduce these computation times by a factor of more than 100 by introducing distributed computing on a Linux based cluster.

Paper Details

Date Published: 11 March 2002
PDF: 11 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458291
Show Author Affiliations
Gerd Ballhorn, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

© SPIE. Terms of Use
Back to Top