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Proceedings Paper

Challenging giga-feature pattern generation
Author(s): Leif Odselius; Lars Ivansen; Anders Thuren; Mikhail Savitsky; Jan-Erik Larsson
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Paper Abstract

Moore's law implies linear growth of integrated circuit density, but the micro-lithographic pattern density grows significantly faster than linear due to OPC embellishments. The progress of technology supporting this growth goes in small steps interleaved by substantial leaps. The leaps occur when the progress in the computing architecture falls behind the requirements from pattern complexity. An established technology can be optimized to a many times surprisingly large extent, but increasing demands eventually crosses the border that makes a given technological architecture inadequate and obsolete. Three major issues with micro-lithographic data processing demand new solutions. One is the need for raw computing power. The second is the data transport mechanisms, which must be designed to prevent bottlenecks. A third issue is the basic data structuring, i.e. the efficiency of the pattern data formats. Exploding reticle pattern complexity requires that backward compatibility with legacy formats is abandoned and that the efficiency of the data format is placed in focus. Micronic Laser Systems maintains a technological roadmap for modular and expandable parallel computing architectures, from data input and pre-processing, through fracturing to rasterizing.

Paper Details

Date Published: 11 March 2002
PDF: 9 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458286
Show Author Affiliations
Leif Odselius, Micronic Laser Systems AB (Sweden)
Lars Ivansen, Micronic Laser Systems AB (Sweden)
Anders Thuren, Micronic Laser Systems AB (Sweden)
Mikhail Savitsky, Micronic Laser Systems AB (Sweden)
Jan-Erik Larsson, Micronic Laser Systems AB (Sweden)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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