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Proceedings Paper

Inspection of production alternating PSM reticles using UV-based 365-nm reticle inspection tool
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Paper Abstract

The paper presents results of a thorough study using the UV-based die-to-database mask inspection system ARISTM100i for the inspection of alternating phase shifting masks (AAPSM) designed for ArF (193nm) technology. Specially designed test masks were used to investigate sensitivity limitations of the i-line tool. Main focus is on phase errors, which were treated as a function of defect size, phase, and mask location. In addition, production reticles were inspected using a specially developed sensitivity AAPSM. Production issues like false defect rate and data preparation were addressed. The paper is concluded with a short printability analysis of different phase defects detected during the experiment.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458284
Show Author Affiliations
Anja Rosenbusch, Etec Systems, Inc. (United States)
Michael M. Har-zvi, Etec Systems, Inc. (Israel)
Gidon Gottlib, Etec Systems, Inc. (Israel)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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