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Proceedings Paper

Repair and imaging of 193-nm MoSiON phase-shift photomasks
Author(s): Chris Marotta; Joshua Lessing; Jeff Marshman; Marcus Ramstein
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Paper Abstract

In this paper, we will be discussing the repair of 193 nm Molybdenum Silicide (MoSiON) phase-shift masks by Focused Ion Beam (FIB) technology. Development of a next generation FIB column has allowed greater resolution of photomask patterns enabling efficient repair of 193 nm MoSiON phase-shift mask defects in patterns as small as 480 nm on the mask. The capabilities of this next generation VisIONT ion beam column achieve enhanced imaging at lower ion beam currents, minimizing damage to the substrate material while improving repair profiles. Both clear defects and opaque defects were investigated.

Paper Details

Date Published: 11 March 2002
PDF: 11 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458283
Show Author Affiliations
Chris Marotta, FEI Co. (United States)
Joshua Lessing, FEI Co. (United States)
Jeff Marshman, FEI Co. (United States)
Marcus Ramstein, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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