Share Email Print
cover

Proceedings Paper

Improvement of alt-PSM production process using backside phase-measurement method
Author(s): Hidetaka Saitou; Yasuhiro Koizumi; Syuichi Sanki; Tatsuhiko Kamibayashi; Shiaki M. Murai; Hiroyuki Miyashita; Hiroshi Fujita; Yasutaka Morikawa; Masami Nara; Naoya Hayashi; Morihisa Hoga
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

An alternating phase shift mask (Alt-PSM) enhances resolution and focus margin in wafer print. Therefore it comes into increasing use for device fabrication by KrF and ArF lithography. We have started production of alt-PSMs using quartz etched shifter and single trench structure, which are made by a two-step quartz etching process. This two-step quartz etching process has three writing steps; they are for chrome etching, quartz dry etching and quartz wet etching. We improved alt-PSM production process by using new backside phase measurement method. Consequently phase mean deviation from 180 degree was improved from +/- 2.0degree to +/- 1.5degree. And process steps reduced from 16 to 12 steps because twice alignment writing became once.

Paper Details

Date Published: 11 March 2002
PDF: 9 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458273
Show Author Affiliations
Hidetaka Saitou, Dai Nippon Printing Co., Ltd. (Japan)
Yasuhiro Koizumi, Dai Nippon Printing Co., Ltd. (Japan)
Syuichi Sanki, Dai Nippon Printing Co., Ltd. (Japan)
Tatsuhiko Kamibayashi, Dai Nippon Printing Co., Ltd. (Japan)
Shiaki M. Murai, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Masami Nara, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

© SPIE. Terms of Use
Back to Top