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Proceedings Paper

Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6-NA KrF imaging
Author(s): Ivan Lalovic; Armen Kroyan; Paolo Zambon; Christopher D. Silsby; Nigel R. Farrar
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Paper Abstract

In this study, process latitude, mask error enhancement factor and iso-dense bias have been experimentally measured as a function of the KrF excimer laser bandwidth. The experiment results are in agreement with photoresist simulations over a range of imaged nominal feature sizes from 120nm to 300nm at 0.6/0.75 NA/(sigma) . The mask error enhancement factor (MEEF) is shown to vary by approximately 2.3 percent for 160nm and 3.3 percent for 150nm isolated lines per 0.1pm of excimer-laser bandwidth, characterized by the full width at half maximum (FWHM). The 180nm line iso-dense bias exhibits a shift of approximately 2nm per 0.1pm FWHM. Under the given process conditions, linear empirical relationships are derived for the dependency of MEEF and iso-dense offset on FWHM excimer-laser spectral width for a range of imaged CDs. Such considerations can be used to augment the existing predictive CD-control estimation and model-based optical proximity correction.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458263
Show Author Affiliations
Ivan Lalovic, Cymer, Inc. (United States)
Armen Kroyan, Cymer, Inc. (United States)
Paolo Zambon, Cymer, Inc. (United States)
Christopher D. Silsby, Agilent Technologies (United States)
Nigel R. Farrar, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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