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Proceedings Paper

Application of photosensitive GeO2-B2O3-SiO2 thin films to optical waveguide
Author(s): Hiroaki Nishiyama; Isamu Miyamoto; Kenji Kintaka; Junji Nishii
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Paper Abstract

GeO2-B2-O3-SiO2 thin films were fabricated by plasma enhanced chemical vapor deposition method. Boron codoping into a GeO2-SiO2 thin film induced large absorption in the vicinity of 240nm, and OH absorption decreased compared to GeO2-SiO2 films. These films of 5 micrometers in thickness exhibited large positive refractive index change without hydrogen loading by irradiation with ArF (193nm) excimer laser pulses. Induced refractive index change was approximately 0.002 which was measured by the prism coupling method. A waveguide was written in this high photosensitive glass film by UV irradiation. The guided mode of the waveguide seems to be single and estimated refractive index change was approximately from 0.003 to 0.004. Three unique phenomena were found in 0.2micrometers thick films on Si substrate. First, these films exhibited large negative refractive index and positive thickness changes by irradiation with ArF laser pulses. Induced negative index change was larger than 0.02 and thickness change was more than 1%. Silica films doped only boron or germanium didn't exhibit such negative index changes. Second, the annealing before laser irradiation decreased the photosensitivity of these films remarkably. Third, these induce refractive index and thickness changes were decreased with time rapidly. These mechanisms were under investigation.

Paper Details

Date Published: 25 February 2002
PDF: 4 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456900
Show Author Affiliations
Hiroaki Nishiyama, Osaka Univ. (Japan)
Isamu Miyamoto, Osaka Univ. (Japan)
Kenji Kintaka, National Institute of Advanced Industrial Science and Technology (Japan)
Junji Nishii, National Institute of Advanced Industrial Science and Technology (Japan)

Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Yong Feng Lu; Koji Sugioka; Jan J. Dubowski, Editor(s)

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