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Proceedings Paper

Characterization of fused silica ablation by F2-KrF excimer laser multiwavelength excitation process
Author(s): Kotaro Obata; Koji Sugioka; Toshimitsu Akane; Naoko Aoki; Koichi Toyoda; Katsumi Midorikawa
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Paper Abstract

The novel technique for high-quality ablation and high- efficiency refractive index modification of fused silica by VUV-UV multiwavelength excitation process has been developed, in which both of the commercially available F2 and KrF excimer lasers are simultaneously irradiated to the sample. The high-quality ablation is ascribed to absorption of KrF excimer laser by excited states formed by F2 laser (excited-state absorption mechanism). Dependences of ablation rate on KrF excimer laser fluence at three deferent F2 laser fluences and irradiation timing of each laser beam are investigated. The multiwavelength excitation process is also applied for effective refractive index change. The multiwavelength excitation process achieves twice of diffraction efficiency compared with single wavelength irradiation of F2 laser at same number of incident total photon number. This is caused by the resonance photoionization-like process through the excited state.

Paper Details

Date Published: 25 February 2002
PDF: 4 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456895
Show Author Affiliations
Kotaro Obata, RIKEN-The Institute of Physical and Chemical Research and Science Univ. of Tokyo (Japan)
Koji Sugioka, RIKEN-The Institute of Physical and Chemical Research (Japan)
Toshimitsu Akane, RIKEN-The Institute of Physical and Chemical Research (Japan)
Naoko Aoki, RIKEN-The Institute of Physical and Chemical Research and Science Univ. of Tokyo (Japan)
Koichi Toyoda, Science Univ. of Tokyo (Japan)
Katsumi Midorikawa, RIKEN-The Institute of Physical and Chemical Research (Japan)


Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication

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