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Proceedings Paper

Ultrafast laser ablation of dielectrics employing temporally shaped femtosecond pulses
Author(s): Razvan Stoian; Mark Boyle; Andreas Thoss; Arkadi Rosenfeld; David Ashkenasi; Georg Korn; Eleanor E. B. Campbell; Ingolf V. Hertel
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Paper Abstract

Dielectric materials exposed to ultrashort laser radiation have evidenced individualized paths to deposit the energy into the lattice. Electronic and thermal mechanisms competing in the process of material removal depend on the efficiency of the electrostatic energy accumulation on the surface due to photoionization, as well as on the lattice heating which follows the electron-phonon coupling. The electrostatic surface break-up is a fast, sub-picosecond process, while thermal mechanisms start to dominate on a longer, picosecond time scale given by the electron-lattice equilibration and phase transformation time. The Coulomb- explosion induced ion ejection due to surplus charge accumulated on the surface during the photoionization process is significant only in dielectrics while in semiconductors and metals an efficient neutralization occurs. The significance of the different channels in dielectric materials can be reduced or enhanced by using laser pulses which are modulated on a time scale characteristic for the above mentioned mechanisms. Thus, amplified temporally-shaped pulses, double peaks, or pulse trains with a separation below 1 ps can have a significant effect on the quality of micromachining of transparent materials. The energy deposition can be modulated in such a way that the first pulse of properly chosen energy leads to a softening of the material associated with the onset of heating, thus changing the coupling conditions for the next pulses. This leads to less residual stress accumulation, cleaner structures, and opens the way for a material dependent optimization process.

Paper Details

Date Published: 25 February 2002
PDF: 4 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456853
Show Author Affiliations
Razvan Stoian, Max-Born Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Mark Boyle, Max-Born Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Andreas Thoss, Max-Born Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Arkadi Rosenfeld, Max-Born Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
David Ashkenasi, Laser- und Medizin-Technologie GmbH (Germany)
Georg Korn, Max-Born Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Eleanor E. B. Campbell, Goeteborg Univ. and Chalmers Univ. of Technology (Sweden)
Ingolf V. Hertel, Max-Born Institut fuer Nichtlineare Optik und Kurzzeitspektroskopie (Germany)


Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication

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