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Proceedings Paper

Pulsed-laser deposition of carbon nitride materials
Author(s): ZhongMin Ren; Yongfeng Lu; Z. F. He
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Paper Abstract

Synthesis of carbon nitride has been an important topic in materials science since 1993. Ion-assisted pulsed laser deposition is proven to be a good method to deposit carbon nitride thin films. Both amorphous and crystal (beta) -C3N4 layers can be deposited on many substrates. A standard experimental set-up comprises a pulsed KrF excimer laser (wavelength 248nm, duration approximately 30ns) that is used to ablate the graphite target and a nitrogen ion beam bombarding simultaneously on the substrate. A variety of experimental derivatives have been developed based on pulsed laser deposition. The deposited thin films have been characterized by Auger Electron Spectroscope (AES), X-ray Photoelectron Spectroscopy (XPS), Mass Time of Flight spectrum (TOF), Optical Emission Spectrum (OES), Rutherford Backscattering (RBS), High Energy Backscattering (HEBS), Raman spectroscopy, Fourier Transform Infra-red Spectroscopy (FTIR), Ellipsometry, Electron Diffraction, Scanning Tunneling Microscope (STM) and Atomic force microscope (AFM). Investigations are carried out to identify the binding structure, nitrogen content, electronic properties, optical properties and crystal structures of the deposited thin films.

Paper Details

Date Published: 25 February 2002
PDF: 7 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456817
Show Author Affiliations
ZhongMin Ren, Data Storage Institute (Singapore)
Yongfeng Lu, Data Storage Institute (United States)
Z. F. He, Data Storage Institute (Singapore)

Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication

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