Share Email Print
cover

Proceedings Paper

Ultra-line-narrowed F2 laser for microlithography
Author(s): Hiroshi Komori; Tatsuya Ariga; Hidenori Watanabe; Takahito Kumazaki; Naoki Kitatochi; Kotaro Sasano; Yoshifumi Ueno; Toshihiro Nishisaka; Ryoichi Nohdomi; Kazuaki Hotta; Hakaru Mizoguchi; Kiyoharu Nakao
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The Association of Super-Advanced Electronics Technologies (ASET) started The F2 Laser Lithography Development Project in March 2000, to clarify solutions of base F2 lithography technologies. In this project, we are developing an ultra line-narrowed F2 laser light source for exposure tools tat are employing dioptric projection optics. We have developed an intermediate engineering injection- locking laser system that has an oscillator laser and an amplifier to study the feasibility of an ultra line-narrowed F2 laser. A spectral bandwidth of <0.2pm (FWHM) at a repetition rate of 1000Hz and an average power of 14W has been achieved with this laser system. The laser output performance dependence on the relative delay between oscillator laser and amplifier is also measured.

Paper Details

Date Published: 25 February 2002
PDF: 5 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456815
Show Author Affiliations
Hiroshi Komori, Association of Super-Advanced Electronics Technologies (Japan)
Tatsuya Ariga, Association of Super-Advanced Electronics Technologies (Japan)
Hidenori Watanabe, Association of Super-Advanced Electronics Technologies (Japan)
Takahito Kumazaki, Association of Super-Advanced Electronics Technologies (Japan)
Naoki Kitatochi, Association of Super-Advanced Electronics Technologies (Japan)
Kotaro Sasano, Association of Super-Advanced Electronics Technologies (Japan)
Yoshifumi Ueno, Association of Super-Advanced Electronics Technologies (Japan)
Toshihiro Nishisaka, Association of Super-Advanced Electronics Technologies (Japan)
Ryoichi Nohdomi, Association of Super-Advanced Electronics Technologies (Japan)
Kazuaki Hotta, Association of Super-Advanced Electronics Technologies (Japan)
Hakaru Mizoguchi, Association of Super-Advanced Electronics Technologies (Japan)
Kiyoharu Nakao, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication

© SPIE. Terms of Use
Back to Top