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Proceedings Paper

Modeling of chemical and mechanical aspects in laser restoration of artworks
Author(s): Costas Fotakis; Athanassia Athanassiou; Efi Andreou; Vivi Tornari; Antonia Bonarou; Laura Antonucci; Dmitrios Anglos; Savas K. Georgiou; Vassilis Zafiropulos
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Paper Abstract

In this paper, investigation of photochemical and photomechanical effects induced in polymer substrates under pulsed UV ablation is presented. The examined laser parameters are the wavelength at 248 nm and 193 nm in the nanosecond regime, and the fluence below and above the ablation threshold. The two polymeric substrates used are PMMA and blends of PMMA and PS.

Paper Details

Date Published: 25 February 2002
PDF: 6 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456809
Show Author Affiliations
Costas Fotakis, Foundation for Research and Technology-Hellas (Greece)
Athanassia Athanassiou, Foundation for Research and Technology-Hellas (Greece)
Efi Andreou, Foundation for Research and Technology-Hellas (Greece)
Vivi Tornari, Foundation for Research and Technology-Hellas (Greece)
Antonia Bonarou, Foundation for Research and Technology-Hellas (Greece)
Laura Antonucci, Foundation for Research and Technology-Hellas (Greece)
Dmitrios Anglos, Foundation for Research and Technology-Hellas (Greece)
Savas K. Georgiou, Foundation for Research and Technology-Hellas (Greece)
Vassilis Zafiropulos, Foundation for Research and Technology-Hellas (Greece)


Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication

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