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Proceedings Paper

High-accuracy laser mask repair technology using ps UV solid state laser
Author(s): Yukio Morishige
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Paper Abstract

Laser Mask Repair System named LM700A has been developed to satisfy the increasing demands for higher accuracy with thigh throughput photomask repair system in recent semiconductor industry requirements. This paper introduces the basic configuration of the system, evaluated results for Chromium (Cr) binary masks and Molybdenum Silicide (MoSi) HalfTone (HT) phaseshift masks repairing performances, and the features of removing process using mid range (250ps) pulse duration ablation mechanism.

Paper Details

Date Published: 25 February 2002
PDF: 8 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456808
Show Author Affiliations
Yukio Morishige, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Yong Feng Lu; Koji Sugioka; Jan J. Dubowski, Editor(s)

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