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Proceedings Paper

Profile coating of KB mirror applications at the Advanced Photon Source
Author(s): Chian Liu; L. Assoufid; Albert T. Macrander; Gene E. Ice; J. Z. Tischler
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Paper Abstract

For microfocusing x-ray mirrors, an ellipse shape is desirable for aberration-free optics. However, it is difficult to polish elliptical mirrors to x-ray quality smoothness. A differential coating method to convert a cylindrical mirror to an elliptical one has been previously reported The differential coating was obtained by varying the sputter source power while the mirror was passed through. Here we report a new method of profile coating to achieve the same goal more effectively. In the profile coating, the sputter source power is kept constant, while the substrate is passed over a contoured mask at a constant speed. The mask is placed very close to the substrate level (within 1.0 mm) on a shield-can over the sputter gun. Four-inch-diameter Si wafers were coated through a 100-mm-long by 152-mm-wide aperture on the top of the shield-can. The thickness distribution was then obtained using a spectroscopic ellipsometer with computer-controlled X-Y translation stages. A model has been developed to fit the measured thickness distribution of stationary growth. The relative thickness weightings are then digitized at every point 1 mm apart for the entire open area of the aperture. When the substrate is moving across the shield-can during a deposition, the film thickness is directly proportional to the length of the opening on the can along the moving direction. By equating the summation of relative weighting to the required relative thickness at the same position, the length of the opening at that position can be determined. By repeating the same process for the whole length of the required profile, a contour can be obtained for a desired thickness profile. The contoured mask is then placed on the opening of the shield-can. The number of passes and the moving speed of the substrate are determined according to the required thickness and the growth-rate calibration. The mirror coating profile is determined from the ideal surface figure of a focus ellipse and that obtained from a long trace profiler on the substrate. Preliminary test results using Au as a coating material are presented.

Paper Details

Date Published: 24 December 2002
PDF: 9 pages
Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); doi: 10.1117/12.456298
Show Author Affiliations
Chian Liu, Argonne National Lab. (United States)
L. Assoufid, Argonne National Lab. (United States)
Albert T. Macrander, Argonne National Lab. (United States)
Gene E. Ice, Oak Ridge National Lab. (United States)
J. Z. Tischler, Oak Ridge National Lab. (United States)

Published in SPIE Proceedings Vol. 4782:
X-Ray Mirrors, Crystals, and Multilayers II
Andreas K. Freund; Albert T. Macrander; Tetsuya Ishikawa; James L. Wood, Editor(s)

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