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Proceedings Paper

Optical metrology in the VUV and EUV spectral range
Author(s): Klaus R. Mann; Sebastian Kranzusch; G. Eckert; Christian Gorling; Uwe Leinhos; Christian Peth; Bernd Schafer
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Paper Abstract

In order to improve the efficiency of optical components for microlithography, metrology for comprehensive characterization of DUV and VUV radiation and the related optics has been developed at Laser-Laboratorium Gottingen. The performance of optical components is assessed by measuring absorptance, scatter losses and damage thresholds during ArF and F2 laser irradiation. Absolute linear and non-linear absorption coefficients are determined by high-resolution laser calorimetry, which provides greatly enhanced accuracy as compared to transmissive measurements. This technique accomplishes also fast monitoring of laser induced degradation phenomena. The absorptance data are compared with the results of accompanying high-resolution laser-induced fluorescence measurements. For an assessment of the optical quality of DUV/VUV optics, a specially designed wavefront analyzer based on the Hartmann-Shack principle is employed. This device, which also allows accurate beam characterization of ArF and F2 laser in the near- and far-field, can be used as an alternative to interferometric measurements for "at wavelength" testing of optics, e.g. for on-line monitoring of compaction or lens heating in fused silica.

Paper Details

Date Published: 11 November 2002
PDF: 10 pages
Proc. SPIE 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components, (11 November 2002); doi: 10.1117/12.455923
Show Author Affiliations
Klaus R. Mann, Laser-Lab. Göttingen eV (Germany)
Sebastian Kranzusch, Laser-Lab. Göttingen eV (Germany)
G. Eckert, Laser-Lab. Göttingen eV (Germany)
Christian Gorling, Laser-Lab. Göttingen eV (Germany)
Uwe Leinhos, Laser-Lab. Göttingen eV (Germany)
Christian Peth, Laser-Lab. Göttingen eV (Germany)
Bernd Schafer, Laser-Lab. Göttingen eV (Germany)

Published in SPIE Proceedings Vol. 4779:
Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components
Angela Duparré; Bhanwar Singh, Editor(s)

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