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Proceedings Paper

X-ray lens with kinoform refractive profile created by x-ray lithography
Author(s): Leonid Shabel'nikov; Vladimir Nazmov; Franz Josef Pantenburg; Juergen Mohr; Volker Saile; Vecheslav Yunkin; Sergey Kouznetsov; Valery F. Pindyurin; Irina Snigireva; Anatoly A. Snigirev
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Paper Abstract

X-ray kinoform lenses were proposed earlier as focusing devices with refractive and diffractive properties. Deep X-ray lithography technique was applied to realize kinoform lenses in thick resist layers PMMA. Created lens has rather short focal distance 20 cm at base energy 17.5 keV and full aperture 1.5mm with outermost segments 2 μm in width. Predicted performance of created lens is compared with simple parabolic lenses. Applications of kinoform lenses are considered and potentials of X-ray lithography for creation new versions of refractive focusing devices are discussed.

Paper Details

Date Published: 21 November 2002
PDF: 9 pages
Proc. SPIE 4783, Design and Microfabrication of Novel X-Ray Optics, (21 November 2002); doi: 10.1117/12.455688
Show Author Affiliations
Leonid Shabel'nikov, Institute of Microelectronics Technology (Russia)
Vladimir Nazmov, Institute of Microstructure Technology (Germany)
Franz Josef Pantenburg, Institute of Microstructure Technology (Germany)
Juergen Mohr, Forschungszentrum Karlsruhe GmbH (Germany)
Volker Saile, Forschungszentrum Karlsruhe GmbH (Germany)
Vecheslav Yunkin, Institute of Microelectronics Technology (Russia)
Sergey Kouznetsov, Institute of Microelectronics Technology (Russia)
Valery F. Pindyurin, Budker Institute of Nuclear Physics (Russia)
Irina Snigireva, European Synchrotron Radiation Facility (France)
Anatoly A. Snigirev, European Synchrotron Radiation Facility (France)


Published in SPIE Proceedings Vol. 4783:
Design and Microfabrication of Novel X-Ray Optics
Derrick C. Mancini, Editor(s)

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