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Proceedings Paper

Photolith analysis and control system
Author(s): Usha Srikanth; Srikanth Sundararajan
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Paper Abstract

This paper describes an expert system that assists photolithography inspectors during IC fabrication process. Strict control of the process line is required, lack of control often results in costly errors. In photolithography, flaws that occur during the IC patterning process should be correctable within the same step. The diagnosis and trouble shooting of these flaws are done using the Photolith Analysis and Control (PAC). It is assumed that the readers have a good knowledge of IC processing and are familiar with the technical terminology prevalent in the field. The paper is arranged as follows, section 2 described the chief motivating factors for PAC. This is followed by a description of the user and video interfaces in section 3. Section 4 describes the PAC system in detail, section 5 contains performance and evaluation data and is followed by a conclusion.

Paper Details

Date Published: 1 March 1991
PDF: 5 pages
Proc. SPIE 1468, Applications of Artificial Intelligence IX, (1 March 1991); doi: 10.1117/12.45485
Show Author Affiliations
Usha Srikanth, Hewlett-Packard Co. (United States)
Srikanth Sundararajan, Hewlett-Packard Co. (United States)


Published in SPIE Proceedings Vol. 1468:
Applications of Artificial Intelligence IX
Mohan M. Trivedi, Editor(s)

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