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Proceedings Paper

Sol-gel antireflective spin-coating process for large-size shielding windows
Author(s): Philippe F. Belleville; Philippe Prene; Francoise Mennechez; Christian Bouigeon
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Paper Abstract

The interest of the antireflective coatings applied onto large-area glass components increases everyday for the potential application such as building or shop windows. Today, because of the use of large size components, sol-gel process is a competitive way for antireflective coating mass production. The dip-coating technique commonly used for liquid-deposition, implies a safety hazard due to coating solution handling and storage in the case of large amounts of highly flammable solvent use. On the other hand, spin-coating is a liquid low-consumption technique. Mainly devoted to coat circular small-size substrate, we have developed a spin-coating machine able to coat large-size rectangular windows (up to 1 x 1.7 m2). Both solutions and coating conditions have been optimized to deposit optical layers with accurate and uniform thickness and to highly limit the edge effects. Experimental single layer antireflective coating deposition process onto large-area shielding windows (1000 x 1700 x 20 mm3) is described. Results show that the as-developed process could produce low specular reflection value (down to 1% one side) onto white-glass windows over the visible range (460-750 nm). Low-temperature curing process (120°C) used after sol-gel deposition enables antireflective-coating to withstand abrasion-resistance properties in compliance to US-MIL-C-0675C moderate test.

Paper Details

Date Published: 23 October 2002
PDF: 4 pages
Proc. SPIE 4804, Sol-Gel Optics VI, (23 October 2002); doi: 10.1117/12.453895
Show Author Affiliations
Philippe F. Belleville, Commissariat à l'Energie Atomique (France)
Philippe Prene, Commissariat à l'Energie Atomique (France)
Francoise Mennechez, SOVIS OPTIQUE (France)
Christian Bouigeon, SOVIS OPTIQUE (France)

Published in SPIE Proceedings Vol. 4804:
Sol-Gel Optics VI
Edward J. A. Pope; Helmut K. Schmidt; Bruce S. Dunn; Shuichi Shibata, Editor(s)

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