Share Email Print
cover

Proceedings Paper

High-sensitivity two-photon photoacid generator for three-dimensional microfabrication
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A new photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has a large two-photon absorption cross section that peaks near 705 nm (δ = 690 x 10-50 cm4 s photon-1) and a high quantum yield for the photochemical generation of acid (φH+ ≈ 0.5). Under near-infrared laser irradiation, the molecule produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides at an incident intensity that is one to two orders of magnitude lower than that needed for conventional ultraviolet-sensitive initiators. The new PAG was used in conjunction with the solid epoxide resist Epon SU-8 for negative-tone three-dimensional microfabrication.

Paper Details

Date Published: 4 November 2002
PDF: 9 pages
Proc. SPIE 4809, Nanoscale Optics and Applications, (4 November 2002); doi: 10.1117/12.453776
Show Author Affiliations
Stephen M. Kuebler, Univ. of Arizona (United States)
Kevin Braun, Univ. of Arizona (United States)
Wenhui Zhou, Univ. of Arizona (United States)
Tianyue Yu, Cornell Univ. (United States)
J. Kevin Cammack, Univ. of Arizona (United States)
Christopher Kemper Ober, Cornell Univ. (United States)
Seth R. Marder, Univ. of Arizona (United States)
Optical Sciences Ctr./Univ. of Arizona (United States)
Joseph W. Perry, Univ. of Arizona (United States)
Optical Sciences Ctr./Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 4809:
Nanoscale Optics and Applications
Guozhong Cao; Wiley P. Kirk, Editor(s)

© SPIE. Terms of Use
Back to Top