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Proceedings Paper

Submicron focusing of hard x-ray beam by elliptically figured mirrors for scanning x-ray microscopy
Author(s): Yuzo Mori; Kazuto Yamauchi; Kazuya Yamamura; Hidekazu Mimura; Yasuhisa Sano; Akira Saito; Kazumasa Ueno; Katsuyoshi Endo; Alexei Souvorov; Makina Yabashi; Kenji Tamasaku; Tetsuya Ishikawa
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Paper Abstract

Elliptical mirrors for X-ray microfocusing were manufactured using the new fabrication methods of elastic emission machining (EEM) and plasma chemical vaporization machining (CVM). Surface profiles measured with stitching interferometry showed a maximum deviation around the ideal figure of about 5nm in peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculation, taking the measured surface profile into consideration, well reproduced the measured focusing properties both at the beam waist and around the beam waist. In addition, two-dimensional focusing unit using K-B mirror arrangement was also developed and evaluated to have about 200 × 200 nm2 focusing performance.

Paper Details

Date Published: 24 December 2002
PDF: 7 pages
Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); doi: 10.1117/12.453754
Show Author Affiliations
Yuzo Mori, Osaka Univ. (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)
Kazuya Yamamura, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Akira Saito, Osaka Univ. (Japan)
Kazumasa Ueno, Osaka Univ. (Japan)
Katsuyoshi Endo, Osaka Univ. (Japan)
Alexei Souvorov, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Makina Yabashi, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Kenji Tamasaku, SPring-8/RIKEN (Japan)
Tetsuya Ishikawa, SPring-8/RIKEN (Japan)

Published in SPIE Proceedings Vol. 4782:
X-Ray Mirrors, Crystals, and Multilayers II
Andreas K. Freund; Albert T. Macrander; Tetsuya Ishikawa; James L. Wood, Editor(s)

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