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Proceedings Paper

Fabrication and characterization of Sb-doped Sn02 thin films derived from methacrylic acid modified tin(IV)alkoxides
Author(s): Terho K. Kololuoma; Ari Tolonen; Leena-Sisko Johansson; Joseph M. Campbell; Ari H. O. Karkkainen; Marianne Hiltunen; Tomi Haatainen; Juha T. Rantala
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Paper Abstract

We report on the fabrication of transparent, conductive and directly photopatternable, pure and Sb-doped tin dioxide thin films. Precursors used were antimony(III)isopropoxide and a photo-reactive tin alkoxide synthesized from tin(IV)isopropoxide and methacrylic acid. The synthesis of methacrylic acid modified tin alkoxide was monitored in-situ using IR- and ESI-TOF mass spectroscopic techniques. Sb-doped organo-tin films were deposited via single layer spin coating. After deposition the films were patterned via photopolymerization, using a mercury I-line UV-lamp. All investigated materials could be patterned with 3 μm features. After development in isopropanol, the films were annealed in air, in order to obtain crystalline and conductive films. The electrical conductivities of the annealed thin films with, and without, UV-irradiation were determined using a linear four-point method. The direct photopatterning process was found to increase the film conductivity for all the Sb-doping levels tested. The mechanisms for the increased conductivity were characterized using AFM, XPS and XRD techniques.

Paper Details

Date Published: 23 October 2002
PDF: 9 pages
Proc. SPIE 4804, Sol-Gel Optics VI, (23 October 2002); doi: 10.1117/12.453546
Show Author Affiliations
Terho K. Kololuoma, VTT Electronics (Finland)
Ari Tolonen, Univ. of Oulu (Finland)
Leena-Sisko Johansson, Helsinki Univ. of Technology (Finland)
Joseph M. Campbell, Helsinki Univ. of Technology (Finland)
Ari H. O. Karkkainen, VTT Electronics (Finland)
Marianne Hiltunen, VTT Electronics (Finland)
Tomi Haatainen, VTT Electronics (Finland)
Juha T. Rantala, GuideOptics Oy (Finland)

Published in SPIE Proceedings Vol. 4804:
Sol-Gel Optics VI
Edward J. A. Pope; Helmut K. Schmidt; Bruce S. Dunn; Shuichi Shibata, Editor(s)

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