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Proceedings Paper

Development of thin-film total-reflection mirrors for the XUV FEL
Author(s): Sandra Jacobi; Joerg Wiesmann; Barbara Steeg; Josef Feldhaus; Carsten Michaelsen
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Paper Abstract

A free electron laser for the XUV spectral range is currently under test at the TESLA Test Facility at DESY. High gain has been demonstrated below 100nm wavelength, and it is expected that the FEL will provide intense, sub-picosecond radiation pulses with photon energies up to 200eV. Thin film optical elements required for this facility are currently being developed by the X-ray optics group of the GKSS research center near Hamburg. Sputter-deposited coatings have been prepared for the use as total reflection X-ray mirrors for FEL beam optics. Coatings of low Z elements with the lowest possible absorption and high reflectivity have been investigated. Silicon substrates have been coated with carbon using different deposition conditions. The films were investigated using the soft X-ray reflectometer at the HASYLAB beamline G1. The measurements show that the reflectivity of the films is typically 90% at energies below 200eV and a grazing incidence angle of 4 degrees. The optical constants of these coatings obtained from the reflectivity measurements and are in agreement with tabulated values. The deposition parameters have been optimized resulting in argon contamination free films with near-theoretical performance. Preliminary investigations concerning the heat resistance of the films were also carried out.

Paper Details

Date Published: 28 December 2001
PDF: 6 pages
Proc. SPIE 4500, Optics for Fourth-Generation X-Ray Sources, (28 December 2001); doi: 10.1117/12.452974
Show Author Affiliations
Sandra Jacobi, GKSS Research Ctr. (Germany)
Joerg Wiesmann, GKSS Research Ctr. (Germany)
Barbara Steeg, Deutsches Elektronen-Synchrotron (Germany)
Josef Feldhaus, Deutsches Elektronen-Synchrotron (Germany)
Carsten Michaelsen, GKSS Research Ctr. (Germany)

Published in SPIE Proceedings Vol. 4500:
Optics for Fourth-Generation X-Ray Sources
Roman O. Tatchyn; Andreas K. Freund; Tadashi Matsushita, Editor(s)

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