Share Email Print
cover

Proceedings Paper

Plasma lens for high-flux x-ray radiation
Author(s): Vyacheslav N. Shlyaptsev; Arthur Toor; Roman O. Tatchyn
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this work we describe new kind of refractive lens for focusing of high flux X-ray radiation of next generation X-ray sources. It is proposed to create such lens driving relatively low electric currents inside evacuated capillary made of low-Z material. The numerical simulations show that during the 0.1 - 3 microsecond(s) , 2-6 kA current pulse, the wall sustained stable capillary discharge plasma forms a concave density profile with almost parabolic index of refraction. Compared to solid materials, the plasma is able to sustain 2-3 order of magnitude larger doze ~100 eV/atom and can operate at larger fluxes and specifically in the relatively long wavelength region 1-4 keV where solid materials have dramatically larger absorption. For radiation sources similar to LCLS, the plasma lens can be placed right at the exit of undulator and deliver 3-4 orders of magnitude larger fluxes in the focal spot.

Paper Details

Date Published: 28 December 2001
PDF: 7 pages
Proc. SPIE 4500, Optics for Fourth-Generation X-Ray Sources, (28 December 2001); doi: 10.1117/12.452960
Show Author Affiliations
Vyacheslav N. Shlyaptsev, Univ. of California/Davis and Lawrence Livermore National Lab. (United States)
Arthur Toor, Lawrence Livermore National Lab. (United States)
Roman O. Tatchyn, Stanford Synchrotron Radiation Lab. (United States)


Published in SPIE Proceedings Vol. 4500:
Optics for Fourth-Generation X-Ray Sources
Roman O. Tatchyn; Andreas K. Freund; Tadashi Matsushita, Editor(s)

© SPIE. Terms of Use
Back to Top