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Proceedings Paper

Spatially nanostructured silicon for optical applications
Author(s): Joachim Diener; Dmitri I. Kovalev; Nicolai Kuenzner; Egon Gross; Gennadi Polisski; Frederick Koch; Viktor Yu. Timoshenko; Minoru Fujii
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Paper Abstract

We report on a strong intrinsic optical anisotropy of silicon induced by dielectric nanopatterning. As a result, in-plane birefringence of anisotropically nanostructured (110) oriented Si is found to be 105 times larger than that observed in bulk silicon. The difference of the main values of the anisotropic refractive index (Δn) exceeds that of any natural birefringent crystal. Δn depends strongly on the typical size of the silicon nanowires assembling the layers and the dielectric constant of the medium surrounding these silicon nanoparticles. We show that dielectric stacks of anisotropically nanostructured Si can act as a dichroic distributed Bragg reflectors or optical microcavities. The reflection/transmission behavior of these structures is sensitive to the polarization of the incident linearly polarized light. These findings open the possibility of an application of optical devices based on birefringent silicon layers in a wide field.

Paper Details

Date Published: 5 November 2002
PDF: 11 pages
Proc. SPIE 4808, Optical Properties of Nanocrystals, (5 November 2002); doi: 10.1117/12.451973
Show Author Affiliations
Joachim Diener, Technische Univ. München (Germany)
Dmitri I. Kovalev, Technische Univ. München (Germany)
Nicolai Kuenzner, Technische Univ. München (Germany)
Egon Gross, Technische Univ. München (Germany)
Gennadi Polisski, Technische Univ. München (Germany)
Frederick Koch, Technische Univ. München (Germany)
Viktor Yu. Timoshenko, M.V. Lomonosov Moscow State Univ. (Russia)
Minoru Fujii, Kobe Univ. (Japan)

Published in SPIE Proceedings Vol. 4808:
Optical Properties of Nanocrystals
Zeno Gaburro, Editor(s)

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