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Proceedings Paper

Laser reactive deposition (LRD) processing for planar lightwave circuit (PLC) manufacturing
Author(s): Herman A. Lopez; Prasad Narasimha; Xiangxin Bi
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Paper Abstract

This report will present a new and highly versatile manufacturing technology, Laser Reactive Deposition (LRDTM) processing, to produce planar glass coatings for planar lightwave circuit (PLC) manufacturing. Planar glasses with a wide range of glass compositions offering various passive and active optical functionalities have been produced using this technology. In particular, LRDTM processing removes a major bottleneck experienced by existing glass fabrication technologies in the high speed deposition of thick and complex glasses. In LRDTM processing, instead of depositing atoms or molecules a layer at a time, nanoscale particles produced in situ are used as fundamental building blocks for planar glass fabrication. The significantly larger mass of these nanoscale clusters in comparison to atoms or molecules has enabled a much higher throughput and lower cost. Optical quality glasses are obtained by a subsequent high temperature consolidation process. The nanoscale particle size and narrow size distribution, uniquely offered by LRDTM processing, are critical for the fabrication of high optical quality planar glass. We have demonstrated in this work that LRDTM processing can produce high quality doped waveguide glasses such as phosphorous-doped silicate glass and UV photosensitive glasses such as germanium-doped silicate glass. We have also demonstrated the capabilities of LRDTM processing in controlling refractive index and layer thickness of the waveguide core to achieve single mode light propagation at 1.55 microns. Finally, we will present characterization results on basic parameters including propagation loss, surface roughness, and refractive index and thickness uniformity on 4 inch planar glass wafers deposited using LRDTM processing.

Paper Details

Date Published: 4 November 2002
PDF: 8 pages
Proc. SPIE 4809, Nanoscale Optics and Applications, (4 November 2002); doi: 10.1117/12.451661
Show Author Affiliations
Herman A. Lopez, NeoPhotonics Corp. (United States)
Prasad Narasimha, NeoPhotonics Corp. (United States)
Xiangxin Bi, NeoPhotonics Corp. (United States)


Published in SPIE Proceedings Vol. 4809:
Nanoscale Optics and Applications
Guozhong Cao; Wiley P. Kirk, Editor(s)

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