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Proceedings Paper

Irradiation of EUV multilayer optics with synchrotron radiation of a different time structure
Author(s): Roman Klein; Frank Scholze; R. Thornagel; Johannes Tummler; M. Wedowski; R. Jansen; B. Mertens; A. van de Runstraat; Gerhard Ulm
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Paper Abstract

Extensive investigations on the lifetime of EUVL optics using synchrotron radiation [1, 2, 3] have been performed at the radiometry laboratory [4] of the Physikalisch-Technische Bundesanstalt (PTB) at the BESSY II electron storage ring in the past. Nevertheless, synchrotron radiation shows a very different time structure as compared to the radiation of EUVL sources to be used in lithography tools. To assess the question, whether the different time structure of the radiation has an impact on the contamination behavior of EUVL optics, an irradiation experiment was performed using synchrotron radiation of different time structure available at the BESSY II electron storage ring: Keeping all other parameters constant, radiation from the normal operation mode of BESSY II, which resembles quasi-cw- illumination, and the special single bunch operation mode, which gives pulsed synchrotron radiation with 1.25 MHz repetition rate were used to irradiate samples in a defined residual gas environment. The reflectance of the samples were measured before and after the illumination to determine the loss in reflectance due to irradiation. Although the time structure of the single bunch mode still differs considerably from those of potential EUVL sources, trends in the contamination behavior could possibly be observed.

Paper Details

Date Published: 24 December 2002
PDF: 8 pages
Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); doi: 10.1117/12.451352
Show Author Affiliations
Roman Klein, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
R. Thornagel, Physikalisch-Technische Bundesanstalt (Germany)
Johannes Tummler, Physikalisch-Technische Bundesanstalt (Germany)
M. Wedowski, Carl Zeiss (Germany)
R. Jansen, TNO TPD (Netherlands)
B. Mertens, TNO TPD (Netherlands)
A. van de Runstraat, TNO TPD (Netherlands)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 4782:
X-Ray Mirrors, Crystals, and Multilayers II
Andreas K. Freund; Albert T. Macrander; Tetsuya Ishikawa; James L. Wood, Editor(s)

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