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Proceedings Paper

Imaging ellipsometry for high-spatial-resolution metrology
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Paper Abstract

The polarization change that accompanies diffraction from sub- wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

Paper Details

Date Published: 26 December 2001
PDF: 12 pages
Proc. SPIE 4435, Wave Optics and VLSI Photonic Devices for Information Processing, (26 December 2001); doi: 10.1117/12.451132
Show Author Affiliations
Qiwen Zhan, Univ. of Minnesota/Twin Cities (United States)
James R. Leger, Univ. of Minnesota/Twin Cities (United States)


Published in SPIE Proceedings Vol. 4435:
Wave Optics and VLSI Photonic Devices for Information Processing
Pierre Ambs; Fred Richard Beyette; Fred Richard Beyette, Editor(s)

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