Share Email Print
cover

Proceedings Paper

Imaging ellipsometry for high-spatial-resolution metrology
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The polarization change that accompanies diffraction from sub- wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

Paper Details

Date Published: 26 December 2001
PDF: 12 pages
Proc. SPIE 4435, Wave Optics and VLSI Photonic Devices for Information Processing, (26 December 2001); doi: 10.1117/12.451132
Show Author Affiliations
Qiwen Zhan, Univ. of Minnesota/Twin Cities (United States)
James R. Leger, Univ. of Minnesota/Twin Cities (United States)


Published in SPIE Proceedings Vol. 4435:
Wave Optics and VLSI Photonic Devices for Information Processing
Pierre Ambs; Fred Richard Beyette; Fred Richard Beyette, Editor(s)

© SPIE. Terms of Use
Back to Top