Share Email Print

Proceedings Paper

Initial results from the EUV engineering test stand
Author(s): Daniel A. Tichenor; Avijit K. Ray-Chaudhuri; Sang Hun Lee; Henry N. Chapman; William C. Replogle; Kurt W. Berger; Richard H. Stulen; Glenn D. Kubiak; Leonard E. Klebanoff; John B. Wronosky; Donna J. O'Connell; Alvin H. Leung; Karen J. Jefferson; William P. Ballard; Layton C. Hale; Kenneth L. Blaedel; John S. Taylor; James A. Folta; Eberhard Adolf Spiller; Regina Soufli; Gary E. Sommargren; Donald W. Sweeney; Patrick P. Naulleau; Kenneth A. Goldberg; Eric M. Gullikson; Jeffrey Bokor; David T. Attwood; Uwe Mickan; Ralph M. Hanzen; Eric M. Panning; Pei-yang Yan; John E. Bjorkholm; Charles W. Gwyn
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The Engineering Test Stand (ETS) is an EUV lithography tool designed to demonstrate full-field EUV imaging and provide data required to accelerate production-tool development. Early lithographic results and progress on continuing functional upgrades are presented and discussed. In the ETS a source of 13.4 nm radiation is provided by a laser plasma source in which a Nd:YAG laser beam is focused onto a xenon- cluster target. A condenser system, comprised of multilayer-coated and grazing incidence mirrors, collects the EUV radiation and directs it onto a reflecting reticle. The resulting EUV illumination at the reticle and pupil has been measured and meets requirements for acquisition of first images. Tool setup experiments have been completed using a developmental projection system with (lambda) /14 wavefront error (WFE), while the assembly and alignment of the final projection system with (lambda) /24 WFE progresses in parallel. These experiments included identification of best focus at the central field point and characterization of imaging performance in static imaging mode. A small amount of astigmatism was observed and corrected in situ, as is routinely done in advanced optical lithographic tools. Pitch and roll corrections were made to achieve focus throughout the arc-shaped field of view. Scan parameters were identified by printing dense features with varying amounts of magnification and skew correction. Through-focus scanned imaging results, showing 100 nm isolated and dense features, will be presented. Phase 2 implementation goals for the ETS will also be discussed.

Paper Details

Date Published: 20 December 2001
PDF: 10 pages
Proc. SPIE 4506, Soft X-Ray and EUV Imaging Systems II, (20 December 2001); doi: 10.1117/12.450953
Show Author Affiliations
Daniel A. Tichenor, Sandia National Labs. (United States)
Avijit K. Ray-Chaudhuri, Sandia National Labs. (United States)
Sang Hun Lee, Intel Corp. (United States)
Henry N. Chapman, Lawrence Livermore National Lab. (United States)
William C. Replogle, Sandia National Labs. (United States)
Kurt W. Berger, Sandia National Labs. (United States)
Richard H. Stulen, Sandia National Labs. (United States)
Glenn D. Kubiak, Sandia National Labs. (United States)
Leonard E. Klebanoff, Sandia National Labs. (United States)
John B. Wronosky, Sandia National Labs. (United States)
Donna J. O'Connell, Sandia National Labs. (United States)
Alvin H. Leung, Sandia National Labs. (United States)
Karen J. Jefferson, Sandia National Labs. (United States)
William P. Ballard, Sandia National Labs. (United States)
Layton C. Hale, Lawrence Livermore National Lab. (United States)
Kenneth L. Blaedel, Lawrence Livermore National Lab. (United States)
John S. Taylor, Lawrence Livermore National Lab. (United States)
James A. Folta, Lawrence Livermore National Lab. (United States)
Eberhard Adolf Spiller, Lawrence Livermore National Lab. (United States)
Regina Soufli, Lawrence Livermore National Lab. (United States)
Gary E. Sommargren, Lawrence Livermore National Lab. (United States)
Donald W. Sweeney, Lawrence Livermore National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. (United States)
David T. Attwood, Lawrence Berkeley National Lab. (United States)
Uwe Mickan, ASML (Netherlands)
Ralph M. Hanzen, ASML (United States)
Eric M. Panning, Intel Corp. (United States)
Pei-yang Yan, Intel Corp. (United States)
John E. Bjorkholm, Intel Corp. (United States)
Charles W. Gwyn, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 4506:
Soft X-Ray and EUV Imaging Systems II
Daniel A. Tichenor; James A. Folta, Editor(s)

© SPIE. Terms of Use
Back to Top