Share Email Print

Proceedings Paper

Lifetime testing of EUV optics using intense synchrotron radiation at the PTB Radiometry Laboratory
Author(s): Roman Klein; Alexander Gottwald; Frank Scholze; R. Thornagel; Johannes Tuemmler; Gerhard Ulm; Marco Wedowski; Frank Stietz; Bas Mertens; Norbert B. Koster; J. van Elp
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Degradation of EUV optics during irradiation is a crucial topic as regards lifetime and performance in EUV lithography. To simulate irradiation conditions for future lithography tools, PTB (the German national metrology institute) operates two dedicated beamlines at the electron storage ring BESSY II. Both, undispersed undulator radiation from an EUV optimized undulator as well as focused and filtered bending magnet radiation can be used. Both beamlines provide EUV radiation with power densities of several mW / mm2. A dedicated irradiation chamber with sample load lock and differential pumping allows components such as substrates, multilayer mirrors or filters to be exposed to EUV radiation under different vacuum conditions. At the same laboratory, high-accuracy EUV reflectometry can be performed for proximate assessment of the resulting performance.

Paper Details

Date Published: 20 December 2001
PDF: 8 pages
Proc. SPIE 4506, Soft X-Ray and EUV Imaging Systems II, (20 December 2001); doi: 10.1117/12.450950
Show Author Affiliations
Roman Klein, Physikalisch-Technische Bundesanstalt (Germany)
Alexander Gottwald, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
R. Thornagel, Physikalisch-Technische Bundesanstalt (Germany)
Johannes Tuemmler, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)
Marco Wedowski, Carl Zeiss (Germany)
Frank Stietz, Carl Zeiss (Germany)
Bas Mertens, TNO (Netherlands)
Norbert B. Koster, TNO (Netherlands)
J. van Elp, TNO (Netherlands)

Published in SPIE Proceedings Vol. 4506:
Soft X-Ray and EUV Imaging Systems II
Daniel A. Tichenor; James A. Folta, Editor(s)

© SPIE. Terms of Use
Back to Top